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Chemical Mechanical Planarization of Semiconductor Materials [Hardcover]

By M. R. Oliver (Editor)
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Item description for Chemical Mechanical Planarization of Semiconductor Materials by M. R. Oliver...

This volume is a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, which is now a major part of state-of-the-art semiconductor technology. There are detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.

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Item Specifications...

Pages   425
Est. Packaging Dimensions:   Length: 0.75" Width: 6.25" Height: 9.5"
Weight:   2.02 lbs.
Binding  Hardcover
Release Date   Mar 19, 2004
Publisher   Springer
ISBN  3540431810  
ISBN13  9783540431817  

Availability  0 units.

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Product Categories

1Books > Special Features > New & Used Textbooks > Engineering > Industrial
2Books > Special Features > New & Used Textbooks > Sciences > Chemistry
3Books > Special Features > New & Used Textbooks > Sciences > Physics
4Books > Subjects > Professional & Technical > Engineering > Chemical > Materials
5Books > Subjects > Professional & Technical > Engineering > Electrical & Optical > Semiconductors
6Books > Subjects > Professional & Technical > Engineering > General
7Books > Subjects > Professional & Technical > Engineering > Industrial, Manufacturing & Operational Syste > General
8Books > Subjects > Professional & Technical > Engineering > Materials > General
9Books > Subjects > Professional & Technical > Professional Science > Chemistry > Physical & Theoretical
10Books > Subjects > Professional & Technical > Professional Science > Physics > General
11Books > Subjects > Science > Chemistry > General & Reference
12Books > Subjects > Science > General
13Books > Subjects > Science > Physics > General

Reviews - What do customers think about Chemical Mechanical Planarization of Semiconductor Materials?

CMP: An Overview  May 25, 2005
This is an outstanding book. It provides an overview of the current status of CMP and serves as a significant update to Steigerwald's 1997 book, which summarized the state of CMP knowledge (which began for electronic applications in 1991)at that time. Much has happened in the second half of CMP's existence.

The book is well edited by Mike Oliver. It includes chapters written by well known CMP specialists that focus on process aspects (technology, equipment, pads, cleaning), on metals (theory and applications), on slurries, and on patterned wafers. It also provides chapters with overviews of CMP. Each chapter has extensive references.

The individual chapters are carefully written to offer an introduction and broad perspectives to new CMP workers while providing depth of insight and material for experienced practitioners. This is an ideal book for advanced undergraduates and graduate students who are working in the field and for those who are starting to do planarization of semiconductor materials. It is also an ideal reference book for experienced polishers since it gives information about the process at a level that is useful and insightful.

I have found the book very useful to me both for its clear summaries of material that I already know about and for its helpful explanations of areas that I am not familiar with. I highly recommend it.


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