Item description for Ion Implantation and Synthesis of Materials (Springer Series in Materials Science) by M. Nastasi...
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
Promise Angels is dedicated to bringing you great books at great prices. Whether you read for entertainment, to learn, or for literacy - you will find what you want at promiseangels.com!
Est. Packaging Dimensions: Length: 9.45" Width: 6.3" Height: 0.79" Weight: 1.19 lbs.
Release Date Sep 25, 2006
ISBN 3540236740 ISBN13 9783540236740
Availability 96 units. Availability accurate as of Jan 24, 2017 10:44.
Usually ships within one to two business days from La Vergne, TN.
Orders shipping to an address other than a confirmed Credit Card / Paypal Billing address may incur and additional processing delay.
More About M. Nastasi
M. Nastasi has an academic affiliation as follows - Los Alamos National Laboratory.